Hoʻonohonoho ʻia ʻo Plasma Etching Machine

He ʻehā ʻāpana ka lako ICP: mua - keʻena haʻahaʻa, keʻena etching, ʻōnaehana hoʻolako kinoea a me ka ʻōnaehana vacuum.

(1) Mamua-keena mimi

ʻO ka hana o ke keʻena ma mua-e hōʻoia i ka mālama ʻia ʻana o ke keʻena etching ma kahi pae ʻūhā i hoʻonohonoho ʻia, ʻaʻole pili ʻia e ke kaiapuni waho (e like me ka lepo, ka mahu wai), a hoʻokaʻawale i nā kinoea pōʻino mai ka lumi maʻemaʻe. Aia i loko o kahi uhi, kahi manipulator, kahi mīkini hoʻoili, kahi puka kaʻawale, etc.

(2) Keena etching

ʻO ke keʻena etching ke kumu kumu o nā lako etching ICP. He hopena koʻikoʻi ia i ka nui o ka etching, ka verticality o ka etching, a me ka roughness. ʻO nā mea nui o ke keʻena etching ʻo: electrode luna, ICP radio frequency unit, RF radio frequency unit, lower electrode system, temperature control system, etc.

(3) Pūnaehana hoʻolako kinoea

ʻO ka ʻōnaehana hoʻolako kinoea e hāʻawi i nā kinoea etching like ʻole i ke keʻena etching, a e hoʻomalu pono i ka holo ʻana o ke kinoea a kahe ʻana ma o ka mea hoʻoponopono kaomi (PC) a me ka mana kahe nui (MFC). ʻO ka ʻōnaehana hoʻolako kinoea i loko o kahi ʻōmole kumu kinoea, kahi pipeline hoʻopuka kinoea, kahi ʻōnaehana hoʻomalu, kahi hui hui, etc.

(4) Pūnaehana Māmā
He ʻelua ʻōnaehana ʻōhua, hoʻokahi no ka -keʻena māma mua a ʻo kekahi no ke keʻena etching. Hoʻokuʻu ʻia ke keʻena ma mua-e ka pamu mīkini. Aia wale nō ke ki'eki'e o ka māha ma ka -keena māma mua i ka waiwai i ho'onohonoho 'ia, hiki ke wehe 'ia ka puka ka'awale no ka ho'ololi 'ana i ka wafer. Hāʻawi ʻia ka ʻōpala i loko o ke keʻena etching e ka mīkini mīkini a me ka molecular pump. Hoʻokuʻu ʻia nā kinoea i hana ʻia e ka pane ʻana i loko o ke keʻena etching e ka ʻōnaehana vacuum.